LANScientific SuperSEM Benchtop Scanning Electron Microscope, using cutting-edge electron optical technology, realizes real-time joint analysis of scanning electron microscope (SEM) and energy dispersive X-ray spectroscopy (EDS) detector. SEM technology is used to obtain structural information on the surface of the sample, and EDS is used for chemical element analysis and characterization. LSEM-100 not only simplifies the analysis process of many materials but also provides high-quality qualitative and quantitative composition information while imaging through real-time superposition of color element distribution and SEM images.
In addition, SuperSEM is also equipped with high acceleration voltage, multi-angle observation and supporting data analysis software, which can automatically focus, scan quickly, and observe the distribution of sample elements in real time in video mode, ensuring accurate and efficient image acquisition and analysis. It is suitable for the analysis of materials such as metals, ceramics, batteries, coatings, cement, and soft matter, and is a powerful assistant for scientific research and industrial testing.
metallic materials, non-metallic materials |
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 Earth science |
Criminal investigation |
| Edition | SuperSEM N10 | SuperSEM N10eX | SuperSEM N10Plus | SuperSEM N10XL |
| Size（W×L×H） | 292×570×515 mm | 292×570×515 mm | 330×614×547 mm | 330×614×547mm |
| Weight | 55KG | 56KG | 57KG | 58KG |
| Acceleration voltage | 5 kV、10 kV、15 kV | 5 kV、10 kV、15 kV | 5 kV、10 kV、15 kV 20 kV、25 kV、30 kV | 5 kV、10 kV、15 kV 20 kV、25 kV、30 kV |
| 3D moving sample stage | X:25 mm Y:25 mm Z:30 mm | X:25 mm Y:25 mm Z:30 mm | X:25 mm Y:25 mm Z:30 mm | The large sample room allows analysis of samples up to 100 x 100mm |
| The maximum size sample | 90 mm (diameter) 40 mm (thickness) | 90 mm (diameter) 40 mm (thickness) | 90 mm (diameter) 40 mm (thickness) | |
| Multiplying Power | ×10～×100,000（Photo magnification） ×25～×250,000（Display multiplier） | |||
Electron Gun | Pre-centered cartridge tungsten filament | |||
| Detector | BSE:High-Sensitivity 4-segment BSE detector EDS：Real-time energy spectrum pseudo-color imaging | BSE:High-Sensitivity 4-segment BSE detector SE:Secondary electron detector EDS：Real-time energy spectrum pseudo-color imaging | BSE:High-Sensitivity 4-segment BSE detector SE:Secondary electron detector EDS：Real-time energy spectrum pseudo-color imaging | BSE:High-Sensitivity 4-segment BSE detector SE:Secondary electron detector EDS：Real-time energy spectrum pseudo-color imaging |
| EDS Parameter | Detector type: silicon drift detector Detection area: 30mm2 Resolution: 130eV Range of elemental analysis: B -U | |||
| Image signal | Backscattered electron Self-developed real-time energy spectrum detector Mix (Backscattered electron +Real-time energy spectrum pseudo-color imaging) | Backscattered electron Self-developed real-time energy spectrum detector Secondary electron Mix (Backscattered electron +Secondary electron+Real-time energy spectrum pseudo-color imaging) | Backscattered electron Self-developed real-time energy spectrum detector Secondary electron Mix (Backscattered electron +Secondary electron+Real-time energy spectrum pseudo-color imaging) | Backscattered electron Self-developed real-time energy spectrum detector Secondary electron Mix (Backscattered electron +Secondary electron+Real-time energy spectrum pseudo-color imaging) |
| Vacuum mode | Standard | Standard | Conductor: BSE Standard Charge-up reduction | Conductor: BSE Standard Charge-up reduction |
Evacuation system (vacuum pump) | Turbo molecular pump : 67 L/s×1 unit Diaphragm pump : 20 L/min×1 unit | |||
